Nanoscale patterning of self-assembled dendrimer monolayers using scanning probe lithography

David C. Tully*, Alexander R. Trimble, M. J. Frechet, Kathryn Wilder, Calvin F. Quate

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

The monolayers of dendritic polymers can be prepared by covalent attachment to a silicon wafer surface. These ultra-thin polymer films can serve as effective resists for high resolution lithography using the scanning probe microscope. These dendrimer films may be patterned using the scanning probe lithography (SPL) to create features with dimensions below 60 nm. Although very thin, the dendrimer films are resistant to an aqueous HF etch, allowing the production of a positive tone image as the patterned oxide relief features are selectively removed.

Original languageEnglish (US)
Pages (from-to)402-403
Number of pages2
JournalAmerican Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Volume40
Issue number1
StatePublished - Mar 1999
Externally publishedYes

ASJC Scopus subject areas

  • Polymers and Plastics

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