Nanoscale patterning and electronics on flexible substrate by direct nanoimprinting of metallic nanoparticles

Inkyu Park*, Seung H. Ko, Heng Pan, Costas P. Grigoropoulos, Albert P. Pisano, Jean M.J. Fréchet, Eung Sug Lee, Jun Ho Jeong

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

159 Scopus citations

Abstract

A high-throughput and ultrafine patterning of metallic micro- and nanostructures for electronics in flexible substrates, through a direct nanoimprinting process of metallic nanoparticles, was demonstrated. The imprinting processing temperature was optimized at 80°C to achieve the best filling of the solution into the polydimethylsiloxane (PDMS) stamp. The cross-section of the nanoimprinted microwire is similar to trapezoidal shape but its edge locations are slightly raised and the center portion is flat and lowered. Current-Voltage (I-V) curve along a single gold microwave shows that the imprinted structure behaves as a good ohmic resistor with linear I-V relation. The electrical resistivity of the nanoimprinted and thermally annealed gold microstructures is found to have an average of 1.99 ×10-7 Ωm with a standard deviation of 5.73 ×10-8 Ωm.

Original languageEnglish (US)
Pages (from-to)489-496
Number of pages8
JournalAdvanced Materials
Volume20
Issue number3
DOIs
StatePublished - Feb 4 2008

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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