Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism

Marie Kryask, Markos Trikeriotis, Christine Ouyang, Sovik Chakrabarty, Emmanuel P. Giannelis, Christopher K. Ober

Research output: Contribution to journalArticlepeer-review

30 Scopus citations

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Engineering & Materials Science

Chemical Compounds