Nanometer metrology by means of backscattered electrons

E. Di Fabrizio*, L. Grella, M. Gentili, M. Baciocchi, L. Mastrogiacomo, R. Maggiora

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

A computational and graphical algorithms for the extraction of metrological data on metal structures at the nanometer scale using an electron-beam machine were developed and compared. These two algorithms were used to prove the possibility of extracting linewidth measurements of the beam once the beam diameter is known. Comparison of electron-beam measurements and scanning-electron microscope measurements showed good agreement of results. The fulfillment of dimensional control requirements made e-beam machine one of most reliable tool for metrological studies at nanometer level.

Original languageEnglish (US)
Pages (from-to)321-326
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume13
Issue number2
DOIs
StatePublished - Mar 1995
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)

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