Nanoindentation and birefringence measurements on fused silica specimen exposed to low-energy femtosecond pulses

Yves Bellouard*, Tristan Colomb, Christian Depeursinge, Mark Dugan, Ali A. Said, Philippe Bado

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

67 Scopus citations

Abstract

Femtosecond laser pulses used in a regime below the ablation threshold have two noticeable effects on Fused Silica (a-SiO2): they locally increase the material refractive index and modify its HF etching selectivity. The nature of the structural changes induced by femtosecond laser pulses in fused silica is not fully understood. In this paper, we report on nanoindentation and birefringence measurements on fused silica exposed to low-energy femtosecond laser pulses. Our findings further back the hypothesis of localized densification effect even at low energy regime.

Original languageEnglish (US)
Pages (from-to)8360-8366
Number of pages7
JournalOptics Express
Volume14
Issue number18
DOIs
StatePublished - Jan 1 2006

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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