Nanofabrication of fresnel zone plates for x-ray focusing

Marco Baciocchi, Enzo Di Fabrizio, Massimo Gentili, Luca Grella, Romano Maggiora, Luigi Mastrogiacomo, Daniela Peschiaroli

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

In this paper E-beam nanolithography and gold electroplating on very thin silicon nitride membranes, are combined for fabrication of amplitude soft X-ray Zone Plates (λ=40 Å) with resolution down to 50 nm and external diameters up to 200 jum. In particular, challenges to the lithographic process introduced by advanced and non-standard requirements, such as large external diameters together with a very high resolution external zones pitch, and ring-to-space ratio optimization for higher order focusing (2nd order), will be studied in detail. The mechanism ofimage formation and control is studied by means of Monte Carlo electron scattering modelling, and a self consistent proximity effect routine is specifically developed for the case of Zone Plates. Some of the fabricated ZPs weretested at a dedicated synchrotron microscopy beam line working at 3.7 nm, showing lst-order efficiencies up to9.5% (against a theoretical 10%) and resolutions down to 50 nm for the second order.

Original languageEnglish (US)
Pages (from-to)6758-6763
Number of pages6
JournalJapanese Journal of Applied Physics
Volume34
Issue number12
DOIs
StatePublished - 1995
Externally publishedYes

Keywords

  • Electron beam lithography
  • Nanofabrication
  • X-ray microscopy
  • Zone plates

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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