Multilayer and inhomogeneous optical filters fabricated by PECVD using titanium dioxide and silicon dioxide

S. Larouche*, A. Amassian, S. C. Gujrathi, J. E. Klemberg-Sapieha, L. Martinu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

In the present work, we fabricated model optical filters with multilayer and graded index (inhomogeneous) designs using TiO2, SiO2, and TiO2/SiO2 mixtures. The deposition process was monitored by in situ spectroscopic ellipsometry and reflectometry. The filters were further characterized by ex situ variable angle spectroscopic ellipsometry and spectrophotometry, and their compositional depth profiles were determined by elastic recoil detection in time-of-flight regime. This multitechnique approach allowed us to evaluate the effect of microstructural features on the optical performance.

Original languageEnglish (US)
Pages (from-to)277-281
Number of pages5
JournalProceedings, Annual Technical Conference - Society of Vacuum Coaters
StatePublished - 2001
Externally publishedYes

Keywords

  • Optical filters
  • Plasma-enhanced chemical vapor deposition (PECVD)
  • Silicon dioxide (SiO)
  • Titanium dioxide (TiO)

ASJC Scopus subject areas

  • Mechanical Engineering
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Fluid Flow and Transfer Processes

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