Multi-Level Nanoimprint Lithography for Large-Area Thin Film Transistor Backplane Manufacturing

Tamer Dogan, Joris de Riet, Thijs Bel, Roy Verbeek, Ilias Katsouras, Eric Meulenkamp, Gerwin Gelinck, Auke Jisk Kronemeijer

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

Thin film transistors (TFTs) are the basis for current AMOLED display arrays. For next- generation displays, higher resolution and cost-effective manufacturing of panels is adamant. The current benchmark patterning method in the display industry is photolithography. Here, we propose the use of a hybrid approach of nanoimprint lithography and conventional FPD processing for the realization of high-resolution display backplanes. We demonstrate the realization of sub-micron amorphous oxide semiconductor TFTs with multi-level nanoimprint lithography in order to decrease the number of patterning steps in display manufacturing. Top-gate self-aligned a-IGZO TFTs are realized with performance comparable to benchmark photolithography-based TFTs.
Original languageEnglish (US)
Pages (from-to)241-244
Number of pages4
JournalJournal of Photopolymer Science and Technology
Volume33
Issue number2
DOIs
StatePublished - Jun 30 2020
Externally publishedYes

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