Morphology and roughness of high-vacuum sublimed oligomer thin films

F. Biscarini*, P. Samorí, A. Lauria, P. Ostoja, R. Zamboni, C. Taliani, P. Viville, R. Lazzaroni, Jean-Luc Bredas

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

We present an atomic force microscopy study on the morphology and roughness of sexithienyl (T6) thin films evaporated on mica in high vacuum. The effects of two thermal processes are investigated: (i) temperature of the substrate during evaporation, and (ii) annealing temperature in high vacuum. The former yields a good control on the extension of grain boundaries and the aggregate ordering, but does not affect surface roughness. The latter is characterized by a threshold temperature (∼ 175 °C) above which a smooth continuous surface is formed. The roughness scaling behaviour is analysed by the power spectrum of the topographical profiles. T6 surface is self-affine over 1-2 orders of magnitude of the spatial frequencies. However, films prepared at substrate temperatures above 200 °C or annealed above the critical temperature exhibit an extended self-affine behaviour. The roughness scaling factor suggests a growth process of the Kardar-Parisi-Zhang universality class.

Original languageEnglish (US)
Pages (from-to)439-443
Number of pages5
JournalThin Solid Films
Volume284-285
DOIs
StatePublished - Sep 15 1996

Keywords

  • Growth mechanism
  • Organic substances
  • Roughness scaling analysis
  • Scanning probe microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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