Modifying the Nanostructure of Co[Sio2] Samples by Controlled Annealing

J. C. Denardin*, M. Knobel, L. M. Socolovsky, A. L. Brandl, Xixiang Zhang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

In situ measurements of resistance were made on cosputtered Co 0.35[SiO2]0.65 granular films during annealing. The aim is to control the thermal treatment parameters and map the microstructural changes of the samples, with the respective magnetotransport response. Results of transmission electron microscopy, dc magnetization, and temperature dependence of resistivity, after annealing, show a clear evolution in the nanostructure of the samples, with increasing average Co grain sizes and wider dispersion.

Original languageEnglish (US)
Pages (from-to)2767-2769
Number of pages3
JournalIEEE Transactions on Magnetics
Volume39
Issue number5 II
DOIs
StatePublished - Sep 1 2003

Keywords

  • Heat treatment
  • Magnetic films
  • Magnetoresistance

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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