Modifying the nanostructure of Co[SiO2] samples by controlled annealing

J. C. Denardin, M. Knobel, L. M. Socolovsky, A. L. Brandl, X. X. Zhang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


In this article, on-line measurements of resistance were made on co-sputtered Co[SiO2]0.65 granular films during annealing. The aim was to control the thermal treatment parameters and map the microstructural changes in the sample, and the respective magnetotransport response.

Original languageEnglish (US)
Title of host publicationIntermag 2003 - Program of the 2003 IEEE International Magnetics Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)0780376471, 9780780376472
StatePublished - 2003
Externally publishedYes
Event2003 IEEE International Magnetics Conference, Intermag 2003 - Boston, United States
Duration: Mar 30 2003Apr 3 2003


Other2003 IEEE International Magnetics Conference, Intermag 2003
CountryUnited States


  • Annealing
  • Conductivity
  • Cooling
  • Curve fitting
  • Tin

ASJC Scopus subject areas

  • Engineering(all)


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