Microstructure of SiO2/TiO2 Coatings and Their Use in Graded-Index Optical Filters

S. Larouche*, H. Szymanowski, A. Amassian, J. E. Klemberg-Sapieha, L. Martinu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

In the present work, we study the microstructural properties of SiO 2/TiO2 mixtures deposited by plasma-enhanced chemical vapor deposition using Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and X-ray diffraction. We found that the chemical and physical properties of the mixtures are consistent with a single-phase material. These materials, with an adjustable refractive index, are then applied for the fabrication of rugate filters. For monitoring their deposition, we propose a new technique that analyzes the ellipsometric spectra outside of the rejection band in order to determine, in real-time, the optical thickness of the growing filter. An example is shown for a single-band rugate filter centered at 550 nm.

Original languageEnglish (US)
Pages (from-to)334-338
Number of pages5
JournalProceedings, Annual Technical Conference - Society of Vacuum Coaters
StatePublished - 2003
Externally publishedYes

Keywords

  • Graded-index optical filters
  • Plasma-enhanced chemical vapor deposition (PECVD)
  • Real-time in-situ monitoring
  • Silica/titania mixtures

ASJC Scopus subject areas

  • Mechanical Engineering
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Fluid Flow and Transfer Processes

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