Method of fabricating patterned crystal structures

Liyang Yu (Inventor), Aram Amassian (Inventor)

Research output: Patent

Abstract

A method of manufacturing a patterned crystal structure for includes depositing an amorphous material. The amorphous material is modified such that a first portion of the amorphous thin-film layer has a first height/volume and a second portion of the amorphous thin-film layer has a second height/volume greater than the first portion. The amorphous material is annealed to induce crystallization, wherein crystallization is induced in the second portion first due to the greater height/volume of the second portion relative to the first portion to form patterned crystal structures.
Original languageEnglish (US)
Patent numberWO 2016199093 A1
StatePublished - Dec 15 2016

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