Mechanistic study of a novel chemically amplified resist

S. Ming Lee*, J. M J Frechet

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Over the past years, this laboratory has designed a number of novel chemically amplified photoresists. Many contained molecules with latent electrophilic groups capable of crosslinking aromatic polymers. These groups are activated to carbocationic intermediates by addition of proton generated through irradiation of onium salts. A typical formulation contains poly(4-hydroxystyrene), a small molecule crosslinker and an onium salt. It is apparent that the rate determining step of the crosslinking reaction is the substitution of the benzylic alcohol hydroxyl group by poly(4-hydroxystyrene). In his paper a crosslinker was selected for subsequent study. The phenolic OH group is expected to give increased delocalization of the positive charge by its positive mesomeric effect. In addition, the resist will be fully aqueous base developable due to the solubility of phenols in base.

Original languageEnglish (US)
Title of host publicationPolymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering
PublisherPubl by ACS
Pages32-33
Number of pages2
Volume68
ISBN (Print)0841226644
StatePublished - 1993
Externally publishedYes
EventProceedings of the American Chemical Society Division of Polymeric Materials - Science and Engineering - Denver, CO, USA
Duration: Apr 18 1993Apr 23 1993

Other

OtherProceedings of the American Chemical Society Division of Polymeric Materials - Science and Engineering
CityDenver, CO, USA
Period04/18/9304/23/93

ASJC Scopus subject areas

  • Chemical Engineering (miscellaneous)
  • Polymers and Plastics

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