Magnetoresistance in as-deposited CoCu granular films

Gehui Wen*, Hongwu Zhao, Jiangao Zhao, Xixiang Zhang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

CoCu granular films were prepared by the dc magnetron facing -target sputtering. Magnetoresistance (MR) was measured in the magnetic fields applied in film plane, parallel and perpendicular to the electrical current. Both the anisotropic magnetoresistance (AMR) and the giant magnetoresistance (GMR) were observed. The most interesting observation is that with the AMR increases, but the GMR decreases. The temperature dependence of the MR may be understood by taking into account of the magnetic interactions among Co granules.

Original languageEnglish (US)
Pages (from-to)81-84
Number of pages4
JournalMaterials Science and Engineering C
Volume16
Issue number1-2
DOIs
StatePublished - Oct 20 2001

Keywords

  • CoCu
  • Granular films
  • Magnetoresistance

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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