Magnetic properties in patterned FeMn/NiFe bilayers with different etching depth

Zaibing Guo*, K. B. Li, G. C. Han, Z. Y. Liu, P. Luo, Y. H. Wu

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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    Engineering & Materials Science

    Chemical Compounds