Low Temperature Processed Complementary Metal Oxide Semiconductor (CMOS) Device by Oxidation Effect from Capping Layer

Zhenwei Wang, Hala A. Al-Jawhari, Pradipta K. Nayak, Jesus Alfonso Caraveo-Frescas, Nini Wei, Mohamed N. Hedhili, Husam N. Alshareef

Research output: Contribution to journalArticlepeer-review

42 Scopus citations

Abstract

In this report, both p- and n-type tin oxide thin-film transistors (TFTs) were simultaneously achieved using single-step deposition of the tin oxide channel layer. The tuning of charge carrier polarity in the tin oxide channel is achieved by selectively depositing a copper oxide capping layer on top of tin oxide, which serves as an oxygen source, providing additional oxygen to form an n-type tin dioxide phase. The oxidation process can be realized by annealing at temperature as low as 190°C in air, which is significantly lower than the temperature generally required to form tin dioxide. Based on this approach, CMOS inverters based entirely on tin oxide TFTs were fabricated. Our method provides a solution to lower the process temperature for tin dioxide phase, which facilitates the application of this transparent oxide semiconductor in emerging electronic devices field.
Original languageEnglish (US)
JournalScientific Reports
Volume5
Issue number1
DOIs
StatePublished - Apr 20 2015

Fingerprint Dive into the research topics of 'Low Temperature Processed Complementary Metal Oxide Semiconductor (CMOS) Device by Oxidation Effect from Capping Layer'. Together they form a unique fingerprint.

Cite this