In this paper we present the beamline for X-ray lithography installed at ELETTRA (Trieste, Italy). The peculiarity of the beamline design consists mainly in its wide lithographic window. This is achieved by combining high-pass filters (Beryllium windows or other suitable material filters) with low-pass filters (mirrors at increasing angles of incidence). The design allows to change the spectral range of interest continuously, from the soft (around 1.5 keV) where we can achieve the highest lithographic resolution, to hard X-ray region (higher than 10 keV) where sensitive materials of thickness of tens of microns can be exposed.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering