LILIT beamline for soft and deep X-ray lithography at Elettra

Filippo Romanato*, Enzo Di Fabrizio, Lisa Vaccari, M. Altissimo, D. Cojoc, L. Businaro, Stefano Cabrini

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

28 Scopus citations

Abstract

In this paper we present the beamline for X-ray lithography installed at ELETTRA (Trieste, Italy). The peculiarity of the beamline design consists mainly in its wide lithographic window. This is achieved by combining high-pass filters (Beryllium windows or other suitable material filters) with low-pass filters (mirrors at increasing angles of incidence). The design allows to change the spectral range of interest continuously, from the soft (around 1.5 keV) where we can achieve the highest lithographic resolution, to hard X-ray region (higher than 10 keV) where sensitive materials of thickness of tens of microns can be exposed.

Original languageEnglish (US)
Pages (from-to)101-107
Number of pages7
JournalMicroelectronic Engineering
Volume57-58
DOIs
StatePublished - Jan 1 2001

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'LILIT beamline for soft and deep X-ray lithography at Elettra'. Together they form a unique fingerprint.

Cite this