Isopropanol/water as a developer for poly(dimethylglutarimide)

Robert W. Johnstone*, Ian Grant Foulds, Manu V. Pallapa, Ash M. Parameswaran

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Poly(dimethylglutarimide) (PMGI) is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol (IPA) and water. Samples were irradiated with deep UV at 254 nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254 nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose.

Original languageEnglish (US)
Article number043006
JournalJournal of Micro/Nanolithography, MEMS, and MOEMS
Volume7
Issue number4
DOIs
StatePublished - Jan 1 2008

Keywords

  • Deep UV
  • Developer
  • Dissolution
  • Isopropanol
  • Photoresist
  • Poly(dimethylglutarimide)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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