(Invited) Atomic Layer Deposition for Novel Dye-Sensitized Solar Cells

Nicolas Tétreault, L-P. Heiniger, M Stefik, P. L. Labouchère, Éric Arsenault, N. K. Nazeeruddin, G A. Ozin, M. Grätzel

Research output: Chapter in Book/Report/Conference proceedingConference contribution

19 Scopus citations

Abstract

Herein we present the latest fabrication and characterization techniques for atomic layer deposition of Al 2O 3, ZnO, SnO 2, Nb 2O 5, HfO 2, Ga 2O 3 and TiO 2 for research on dye-sensitized solar cell. In particular, we review the fabrication of state-of-the-art 3D host-passivation-guest photoanodes and ZnO nanowires as well as characterize the deposited thin films using spectroscopic ellipsometry, X-ray diffraction, Hall effect, J-V curves and electrochemical impedance spectroscopy. ©The Electrochemical Society.
Original languageEnglish (US)
Title of host publicationECS Transactions
PublisherThe Electrochemical Society
Pages303-314
Number of pages12
ISBN (Print)9781566779029
DOIs
StatePublished - 2011
Externally publishedYes

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