Interface lithography: A hybrid lithographic approach for the fabrication of patterns embedded in three-dimensional structures

F. Romanato*, R. Kumar, E. Di Fabrizio

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

The aim of this study was to develop a viable technology to realize arbitrary shaped and sized patterns embedded in three-dimensional microstructures. In this paper, we present a new fabrication process based on a binary resist process scheme with the combined use of electron-beam lithography and multi-tilted x-ray lithography. We demonstrate the fabrication of three-dimensional photonic crystal structures with embedded waveguides and the fabrication of a flyover micro-fluidic channel.

Original languageEnglish (US)
Pages (from-to)40-46
Number of pages7
JournalNanotechnology
Volume16
Issue number1
DOIs
StatePublished - Jan 2005
Externally publishedYes

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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