Integration of dual metal gate CMOS with TaSiN (NMOS) and Ru (PMOS) gate electrodes on HfO 2 gate dielectric

Z. B. Zhang*, S. C. Song, C. Huffman, J. Barnett, N. Moumen, Husam Niman Alshareef, P. Majhi, Muhammad Mustafa Hussain, M. S. Akbar, J. H. Sim, S. H. Bae, B. Sassman, B. H. Lee

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

30 Scopus citations

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Engineering & Materials Science