Influence of the vacuum interface on the charge distribution in V2O3 thin films

Udo Schwingenschlögl, R Frésard, V Eyert

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The electronic structure of V2O3 thin films is studied by means of the augmented spherical wave method as based on density functional theory and the local density approximation. We establish that the effects of charge redistribution, induced by the vacuum interface, in such films are restricted to a very narrow surface layer of ≈15 Å thickness. As a consequence, charge redistribution can be ruled out as a source of the extraordinary thickness dependence of the metal–insulator transition observed in V2O3 thin films of ~100–1000 Å thickness.
Original languageEnglish (US)
Pages (from-to)093034
JournalNew Journal of Physics
Volume11
Issue number9
DOIs
StatePublished - Sep 22 2009

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