Influence of contact height on the performance of vertically aligned carbon nanotube field-effect transistors

Jingqi Li, Yingchun Cheng, Zaibing Guo, Zhihong Wang, Zhiyong Zhu, Qing Zhang, Chanpark Chan-Park, Udo Schwingenschlögl, Xixiang Zhang

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Vertically aligned carbon nanotube field-effect transistors (CNTFETs) have been experimentally demonstrated (J. Li et al., Carbon, 2012, 50, 4628-4632). The source and drain contact heights in vertical CNTFETs could be much higher than in flat CNTFETs if the fabrication process is not optimized. To understand the impact of contact height on transistor performance, we use a semi-classical method to calculate the characteristics of CNTFETs with different contact heights. The results show that the drain current decreases with increasing contact height and saturates at a value governed by the thickness of the oxide. The current reduction caused by the increased contact height becomes more significant when the gate oxide is thicker. The higher the drain voltage, the larger the current reduction. It becomes even worse when the band gap of the carbon nanotube is larger. The current can differ by a factor of more than five between the CNTEFTs with low and high contact heights when the oxide thickness is 50 nm. In addition, the influence of the contact height is limited by the channel length. The contact height plays a minor role when the channel length is less than 100 nm. © 2013 The Royal Society of Chemistry.
Original languageEnglish (US)
Pages (from-to)2476
JournalNanoscale
Volume5
Issue number6
DOIs
StatePublished - 2013

ASJC Scopus subject areas

  • Materials Science(all)

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