Influence of argon and oxygen pressure ratio on bipolar-resistive switching characteristics of CeO2−x thin films deposited at room temperature

Muhammad Ismail*, Rehmat Ullah, Riaz Hussain, Ijaz Talib, Anwar Manzoor Rana, Muhammad Mustafa Hussain, Khalid Mahmood, Fayyaz Hussain, Ejaz Ahmed, Dinghua Bao

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Cerium oxide (CeO2−x) film was deposited on Pt/Ti/SiO2/Si substrate by rf magnetron sputtering at room temperature. Resistive switching characteristics of these ceria films have been improved by increasing oxygen content during deposition process. Endurance and statistical analyses indicate that the operating stability of CeO2−x-based memory is highly dependent on the oxygen content. Results indicate that CeO2−x film-based RRAM devices exhibit optimum performance when fabricated at an argon/oxygen ratio of 6:24. An increase in the oxygen content introduced during CeO2−x film deposition not only stabilizes the conventional bipolar RS but also improves excellent switching uniformity such as large ON/OFF ratio (102), excellent switching device-to-device uniformity and good sweep endurance over ~ 500 repeated RS cycles. Conduction in the low-resistance state (LRS) as well as in the low bias field region in the high-resistance state (HRS) is found to be Ohmic and thus supports the conductive filament (CF) theory. In the high voltage region of HRS, space charge limited conduction (SCLC) and Schottky emission are found to be the dominant conduction mechanisms. A feasible filamentary RS mechanism based on the movement of oxygen ions/vacancies under the bias voltage has been discussed.

Original languageEnglish (US)
Article number89
JournalApplied Physics A: Materials Science and Processing
Volume124
Issue number2
DOIs
StatePublished - Feb 1 2018

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

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