In Situ Plasma-Grown Silicon-Oxide for Polysilicon Passivating Contacts

Areej A. Alzahrani, Thomas Allen, Michele de Bastiani, Emmanuel Van Kerschaver, George T. Harrison, Wenzhu Liu, Stefaan De Wolf

Research output: Contribution to journalArticlepeer-review

Abstract

Large-scale manufacturing of polysilicon-based passivating contacts for high-efficiency crystalline silicon (c-Si) solar cells demands simple fabrication of thermally stable SiOx films with well controlled microstructure and nanoscale thickness to enable quantum-mechanical tunneling. Here, plasma-dissociated CO2 is investigated to grow in situ thin (
Original languageEnglish (US)
Pages (from-to)2000589
JournalAdvanced Materials Interfaces
DOIs
StatePublished - Jul 29 2020

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