In situ growth monitoring of nanocomposite TiN/SiN1.3 and TiCxNy/SiCN films using spectroscopic ellipsometry

P. Jedrzejowski*, A. Amassian, E. Bousser, L. Martinu, J. E. Klemberg-Sapieha

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


Spectroscopic ellipsometry has been used to investigate the electronic properties and the growth of TiN-based hard and super hard nanocomposite (nc) coatings, namely TiN, nc-TiN/SiN1.3 and nc-TiCxN/SiCN. These materials, characterized by a hardness of 45-55 GPa, were synthesized by plasma enhanced chemical vapor deposition (PECVD) from TiCl4/ CH 4/SiH4/N2 gas mixtures at a temperature of 500°C. The film optical properties were modeled using mixed Drude (intraband) and Lorentz (interband) electronic absorptions. This allowed us to evaluate, in real-time, the evolution of the electrical properties, while finding an excellent agreement with direct four-point measurements and the microstructural characteristics.

Original languageEnglish (US)
Pages (from-to)68-73
Number of pages6
JournalProceedings, Annual Technical Conference - Society of Vacuum Coaters
StatePublished - 2005
Externally publishedYes


  • Electrical and optical properties
  • Nanocomposites
  • Spectroscopic ellipsometry
  • Super hard films

ASJC Scopus subject areas

  • Mechanical Engineering
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Fluid Flow and Transfer Processes


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