Impact of carbon incorporation on the effective work function of WN and TaN metal gate electrodes

Husam Niman Alshareef, M. Quevedo-Lopez, H. C. Wen, C. Huffman, M. El-Bouanani, B. E. Gnade

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

Plasma carbonization was used to study the effect of carbon incorporation on the work function of metal nitride gates. The work functions were shifted by as much as 200 mV upon the incorporation of 8% carbon. X-ray photoelectron spectroscopy shows that these shifts in the work function values are mainly driven by the formation of metal-carbon and carbon-carbon bonds in the metal gate. In particular, the work function decreased with increasing the metal-carbon bond concentration, reaching as low as 4.28 eV for TaC with 50% carbon. This correlation of bonding with the work function can be used to tune the work function of metal gates.

Original languageEnglish (US)
JournalElectrochemical and Solid-State Letters
Volume11
Issue number7
DOIs
StatePublished - May 26 2008

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Materials Science(all)
  • Physical and Theoretical Chemistry
  • Electrical and Electronic Engineering
  • Electrochemistry

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