High-precision metal masking for multiple-wavelength laser diode fabrication using single-step-ion-implantation-induced quantum well intermixing

Vincent Aimez*, Jacques Beauvais, Jean Beerens, Boon Ooi

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

In this paper we report the development of a new and versatile ion implantation mask system which takes advantage of the high precision offered by recent deposition methods. A stack of alternate layers of two different materials which can be selectively etched is first deposited on the sample. Selective etching is then performed to remove a given number of layers from the stack in the various region of the sample. Owing to a high etching selectivity between the two materials, the thickness of the mask can be fixed very precisely in each region. During ion implantation, a different amount of ions will pass through the mask to reach the sample, according to mask thickness over each region. This method therefore provides a way to achieve a spatial control over the implantation dose, in a single implantation step. Thermal annealing can then be performed to induce quantum well intermixing in the underlying heterostructure, which brings about a blueshift of the emission wavelength. The results obtained with our method, which makes use of low energy ion implantation, for the fabrication ofsingle step graded blueshifting of InP/InGaAs/InGaAsP integrated laser heterostructures are presented. We also present a study of pairs of materials suitable for the mask fabrication, as well as the results of numerical simulations to determine the appropriate thickness ofthe mask layers.

Original languageEnglish (US)
Pages (from-to)607-615
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4087
DOIs
StatePublished - Dec 1 2004
EventApplications of Photonic Technology 4 - Quebec City, QC, Canada
Duration: Jun 12 2000Jun 12 2000

Keywords

  • III-V semiconductors
  • Ion implantation
  • Multilayer masks
  • Photonic integrated devices
  • Quantum well intermixing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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