Growth of vacuum evaporated ultraporous silicon studied with spectroscopic ellipsometry and scanning electron microscopy

Kate Kaminska*, Aram Amassian, Ludvik Martinu, Kevin Robbie

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

53 Scopus citations

Abstract

Using a combination of variable-angle spectroscopic ellipsometry and scanning electron microscopy, we investigated the scaling behavior of uniaxially anisotropic, ultraporous silicon manufactured with glancing angle deposition. We found that both the diameter of the nanocolumns and the spacing between them increase with film thickness according to a power-law relationship consistent with self-affine fractal growth. An ellipsometric model is proposed to fit the optical properties of the anisotropic silicon films employing an effective medium approximation mixture of Tauc-Lorentz oscillator and void. This study shows that the optical response of silicon films made at glancing incidence differs significantly from that of amorphous silicon prepared by other methods due to highly oriented nanocolumn formation and power-law scaling.

Original languageEnglish (US)
Article number013511
JournalJournal of Applied Physics
Volume97
Issue number1
DOIs
StatePublished - Jan 1 2005

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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