Growth and magnetic properties of TiO2: Co anatase thin films by sputtering technique

G. C. Han*, Y. H. Wu, M. Tay, Z. B. Guo, K. B. Li, C. T. Chong

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

TiO2:Co thin films were epitaxially grown in the form of single layer and digital alloy on LaAlO3 substrates by sputtering techniques. A wide range of saturation moment (ms) up to 1.51 μB/Co were obtained, depending on both Co content and deposition parameters. Surface morphology of the films seems to suggest the existence of Co clustering. However, higher ms value is not obtained from the films with the larger and denser clustering, implying that both charge carriers and Co clustering are contributing to the overall magnetism of the sample.

Original languageEnglish (US)
JournalJournal of Magnetism and Magnetic Materials
Volume272-276
Issue numberSUPPL. 1
DOIs
StatePublished - May 2004
Externally publishedYes

Keywords

  • Magnetic semiconductor
  • Sputtering
  • Thin film
  • TiO: Co

ASJC Scopus subject areas

  • Condensed Matter Physics

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