Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications

Meng Yu Lin*, Yung Shuan Sheng, Shu Han Chen, Ching Yuan Su, Lain-Jong Li, Shih Yen Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 104 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation.

Original languageEnglish (US)
Article number061202
JournalJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Volume29
Issue number6
DOIs
StatePublished - Jan 1 2011

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

Fingerprint

Dive into the research topics of 'Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications'. Together they form a unique fingerprint.

Cite this