Generating an etch resistant "resist" layer from common solvents using scanning probe lithography in a fluid cell

Itai Suez, Scott A. Backer, Jean Frechet*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

32 Scopus citations

Abstract

A novel scanning probe lithography scheme is introduced involving the field-induced deposition of etch resistant material generated from common organic solvents such as n-octane, toluene, ethyl alcohol, and dioxane in the tip/sample gap region of a liquid cell. An NH 4F/H 2O 2/ H 2O etchant transfers these structures into 7 nm tall posts in a negative-tone fashion, indicating that an etch resistant, likely carbon-based material is produced by field-induced decomposition of the solvent. This is in sharp contrast to the positive tone images that result from a similar process involving water as the gap electrolyte followed by a similar fluorine-based etching.

Original languageEnglish (US)
Pages (from-to)321-324
Number of pages4
JournalNano Letters
Volume5
Issue number2
DOIs
StatePublished - Feb 1 2005

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Generating an etch resistant "resist" layer from common solvents using scanning probe lithography in a fluid cell'. Together they form a unique fingerprint.

Cite this