Fluorocarbon resist for high-speed scanning probe lithography

Marco Rolandi*, Itai Suez, Andreas Scholl, Jean Frechet

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

22 Scopus citations

Abstract

(Figure Presented) Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s-1 range. Features as small as 27 nm are fabricated on 100-μm2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.

Original languageEnglish (US)
Pages (from-to)7477-7480
Number of pages4
JournalAngewandte Chemie - International Edition
Volume46
Issue number39
DOIs
StatePublished - Oct 16 2007

Keywords

  • Electron microscopy
  • Mass spectrometry
  • Nanostructures
  • Scanning probe lithography
  • Surface chemistry

ASJC Scopus subject areas

  • Chemistry(all)

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