Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography

Zachary M. Fresco*, Nicolas Bensel, Itai Suez, Scott A. Backer, Jean Frechet, Will Conley

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

We present the synthesis and screening of a series of new fluorinated materials designed to act as chemically amplified dissolution inhibitors for 157 nm lithography. Dissolution rates measured using a quartz crystal microbalance apparatus on a variety of matrix polymers as well as initial results demonstrating the imageability of this multi-component system are described.

Original languageEnglish (US)
Pages (from-to)27-35
Number of pages9
JournalJournal of Photopolymer Science and Technology
Volume16
Issue number1
DOIs
StatePublished - Jan 1 2003

Keywords

  • 157 nm
  • Dissolution inhibitor
  • Hexafluoroalcohol
  • QCM

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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