We compare the sharpness of tungsten probe tips produced by the single-step and two-step dynamic electrochemical etching processes. A small radius of curvature (RoC) of 25 nm or less was routinely obtained when the two-step electrochemical etching (TEE) process was adopted, while the smallest achievable RoC was ∼10 nm, rendering it suitable for atomic force microscopy (AFM) or scanning tunneling microscopy (STM) applications. © 2011 IEEE.
|Original language||English (US)|
|Title of host publication||8th International Conference on High-capacity Optical Networks and Emerging Technologies|
|Publisher||Institute of Electrical and Electronics Engineers (IEEE)|
|Number of pages||3|
|State||Published - Dec 2011|