Fabrication of three-dimensional stamps for embossing techniques by lithographically controlled isotropic wet etching

Massimo Tormen*, Alessandro Carpentiero, Lisa Vaccari, Matteo Altissimo, Enrico Ferrari, Dan Cojoc, Enzo Di Fabrizio

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

The excellent characteristics that nanoimprint lithography (NIL) shows as a two-dimensional patterning technique, such as resolution and throughput, are shared with its three-dimensional (3D) structuring version. Nevertheless, the potentialities of NIL for 3D structuring remain largely unexplored and unexploited, hindered by the difficulties in the fabrication of high quality masters with throughput suitable for practical purposes. We present a technique that allows production of stamps with tightly controlled three-dimensional profiles in the 10 nm-100 μm scale range. This technique consists of a sequence of lithographic steps alternated with isotropic wet etching processes performed on a quartz substrate. Scanning electron microscopy and atomic force microscopy characterization shows that 3D structures with very accurate shape control and nanometer scale surface roughness can be formed with this method. Quartz stamps have been employed in nanoimprint, hot embossing, or casting processes to shape complex plastic elements. This technique is expected to have many applications in different nanotechnology-related fields such as optics, nanomechanics, microfluidics, and plasmon nano-optics.

Original languageEnglish (US)
Pages (from-to)2920-2924
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume23
Issue number6
DOIs
StatePublished - Nov 1 2005

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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