Fabrication of sub-50 nm current-perpendicular-to-plane spin valve sensors

G. C. Han*, K. B. Li, Y. K. Zheng, J. J. Qiu, P. Luo, L. H. An, Zaibing Guo, Z. Y. Liu, Y. H. Wu

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    3 Scopus citations

    Abstract

    A new process is developed to fabricate sub-50 nm current-perpendicular-to- plane (CPP) spin valve sensors. This processing technology relates to a feature reduction method using hard mask technique. The feature size is first reduced by an isotropic wet etch process of hard mask, and then transferred to CPP sensor by an ion milling process. Using this approach, the feature size can be reduced from above 100 nm determined by lithography technology to several nanometers. An etch back process is developed for the sensor via opening. Sidewall-free sub-50 nm CPP sensors have been successfully fabricated. The sensors are characterized through magnetoresistance measurements and show typical CPP characteristics.

    Original languageEnglish (US)
    Pages (from-to)41-44
    Number of pages4
    JournalThin Solid Films
    Volume505
    Issue number1-2
    DOIs
    StatePublished - May 18 2006

    Keywords

    • CPP spin valve
    • Feature size
    • Processing

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

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