Fabrication of semi-continuous profile diffractive optical elements for beam shaping by electron beam lithography

A. Nottola*, A. Gerardino, M. Gentili, Enzo Di Fabrizio, S. Cabrini, P. Melpignano, G. Rotaris

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

17 Scopus citations

Abstract

We report a description of the design and fabrication process of semi-continuous profile Diffractive Optical Elements (DOEs) to be used as beam shapers. The process employs Electron Beam Lithography as a tool to obtain complex 3D profiles by direct writing onto PMMA resist. We also present a characterization of the resist for different types of developer and different developing times. This study shows how important is to fix such parameters for the assignment of the electron dosage values required to obtain the correct resist heights, through the Normalized Resist Thickness (NRT) vs. absorbed dosage curve. Simple patterns were fabricated and examined in order to check the accuracy of the dose calibration and the sensitivity to process errors. Preliminary optical tests on a DOE realized with a 16-level profile were also performed, and gave a good response.

Original languageEnglish (US)
Pages (from-to)325-328
Number of pages4
JournalMicroelectronic Engineering
Volume53
Issue number1
DOIs
StatePublished - Jan 1 2000
Event25th International Conference on Micro- and Nano-Engineering - Rome, Italy
Duration: Sep 21 1999Sep 23 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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