Fabrication of self-standing, size-adjustable nickel structures with nanometer resolution

Enzo Di Fabrizio*, M. Gentili, L. Mastrogiacomo

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

Silicon micromachining is an attractive technique for a wide class of miniaturized components and systems. We have designed and fabricated several self-standing devices based on surface and bulk micromachining techniques. Our process makes use of Silicon Nitride membranes, which are patterned by electron beam (e-beam) lithography and removed after pattern metallization by reactive ion etching. The fabricated microstructures can be moved and adjusted by electromagnetic actuation.

Original languageEnglish (US)
Pages (from-to)161-164
Number of pages4
JournalMicroelectronic Engineering
Volume46
Issue number1
DOIs
StatePublished - Jan 1 1999
EventProceedings of the 1998 International Conference on Micro- and Nanofabrication (MNE98) - Leuven
Duration: Sep 22 1998Sep 24 1998

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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