Fabrication of nanostructures using electron beam interference technique - a proposal

O. Gunawan*, S. L. Ng, C. H. Ooi, B. S. Ooi, Y. L. Lam, Y. C. Chan

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A method based on electron beam interference, for nanostructure fabrication is proposed. Nano scale wires or gratings, as well as dots, generated demonstrate that the method is simple, maskless and has high throughput.

Original languageEnglish (US)
Title of host publicationPacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest
PublisherIEEE
Pages314-315
Number of pages2
Volume2
StatePublished - 1999
Externally publishedYes
EventProceedings of the 1999 Pacific Rim Conference on Lasers and Electro-Optcis (CLEO/PACIFIC Rim '99) - Seoul, South Korea
Duration: Aug 30 1999Sep 3 1999

Other

OtherProceedings of the 1999 Pacific Rim Conference on Lasers and Electro-Optcis (CLEO/PACIFIC Rim '99)
CitySeoul, South Korea
Period08/30/9909/3/99

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Fabrication of nanostructures using electron beam interference technique - a proposal'. Together they form a unique fingerprint.

Cite this