Fabrication of 5 nm resolution electrodes for molecular devices by means of electron beam lithography

Enzo Di Fabrizio*, Luca Grella, Massimo Gentili, Marco Baciocchi, Luigi Mastrogiacomo, Piero Morales

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

24 Scopus citations

Abstract

Electron beam lithography is used to fabricate two-metal electrode tip-shaped structures. The distance between the tips is continuously controlled to be between 5 and 70 nm. The electron beam lithography process is robust and the tip separation is well controlled in the sense that the smallest distance between the tips is a consequence of the design and not a consequence of randomly distributed metal spots around the tip area. Interest in these structures is due to the fact that they can be used to fabricate rectifiers, working with single molecule, designed to exhibit semiconductor properties.

Original languageEnglish (US)
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume36
Issue number1 PART A/B
StatePublished - Jan 15 1997
Externally publishedYes

Keywords

  • Electron beam lithography
  • High aspect ratio
  • Molecular device
  • PMMA
  • Rectifier
  • Resist adhesion

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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