Exposure latitude and CD control study for additively patterned x-ray mask with GBit DRAM complexity

M. Baciocchi*, Enzo Di Fabrizio, M. Gentili, L. Grella, L. Maggiora, L. Mastrogiacomo, D. Peschiaroli, S. Choi, Y. J. Jeon, H. B. Chung, H. J. Yoo

*Corresponding author for this work

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