Evolution of Filament Formation in Ni/HfO 2 /SiO x /Si-Based RRAM Devices

Xing Wu, Sen Mei, Michel Bosman, Nagarajan Raghavan, Xixiang Zhang, Dong Kyu Cha, Kun Li, Kin Leong Pey

Research output: Contribution to journalArticlepeer-review

33 Scopus citations
Original languageEnglish (US)
Pages (from-to)1500130
JournalAdvanced Electronic Materials
Issue number11
StatePublished - Oct 9 2015

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