Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography

V. Bellas*, E. Tegou, I. Raptis, E. Gogolides, P. Argitis, H. Iatrou, Nikolaos Hadjichristidis, E. Sarantopoulou, A. C. Cefalas

*Corresponding author for this work

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