Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography

V. Bellas*, E. Tegou, I. Raptis, E. Gogolides, P. Argitis, H. Iatrou, Nikolaos Hadjichristidis, E. Sarantopoulou, A. C. Cefalas

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

27 Scopus citations

Abstract

The synthesis of different siloxane and cage-type silsesquioxane copolymers was examined. Requirements for positive aqueous base development were studied. Results demonstrate the possibility of using polyhedral oligomeric silsesquioxane based materials as 157 nm resists, at least in the bilayer mode.

Original languageEnglish (US)
Pages (from-to)2902-2908
Number of pages7
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume20
Issue number6
DOIs
StatePublished - Nov 1 2002

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Evaluation of siloxane and polyhedral silsesquioxane copolymers for 157 nm lithography'. Together they form a unique fingerprint.

Cite this