The synthesis of different siloxane and cage-type silsesquioxane copolymers was examined. Requirements for positive aqueous base development were studied. Results demonstrate the possibility of using polyhedral oligomeric silsesquioxane based materials as 157 nm resists, at least in the bilayer mode.
|Original language||English (US)|
|Number of pages||7|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - Nov 1 2002|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering