Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy

Scott A. Backer*, Itai Suez, Zachary M. Fresco, Jean Frechet, Josh A. Conway, Shantha Vedantam, Hyojune Lee, Eli Yablonovitch

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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Engineering & Materials Science

Physics & Astronomy