Epitaxially-grown Gallium Nitride on Gallium Oxide substrate for photon pair generation in visible and telecomm wavelengths

Kashif M. Awan, Ksenia Dolgaleva, Mufasila Mumthaz Muhammed, Iman S. Roqan

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Gallium Nitride (GaN), along with other III-Nitrides, is attractive for optoelectronic and electronic applications due to its wide direct energy bandgap, as well as high thermal stability. GaN is transparent over a wide wavelength range from infra-red to the visible band, which makes it suitable for lasers and LEDs. It is also expected to be a suitable candidate for integrated nonlinear photonic circuits for a wide range of applications from all-optical signal processing to quantum computing and on-chip wavelength conversion. Despite its abundant use in commercial devices, there is still need for suitable substrate materials to reduce high densities of threading dislocations (TDs) and other structural defects like stacking faults, and grain boundaries. All these defects degrade the optical quality of the epi-grown GaN layer as they act as non-radiative recombination centers.
Original languageEnglish (US)
Title of host publication2016 Photonics North (PN)
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
ISBN (Print)9781509013739
DOIs
StatePublished - Aug 11 2016

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