Emission wavelength trimming of self-assembled InGaAs/GaAs quantum dots with GaAs/AlGaAs superlattices by rapid thermal annealing

H. S. Djie, D. N. Wang, B. S. Ooi*, J. C M Hwang, X. M. Fang, Y. Wu, J. M. Fastenau, W. K. Liu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

The effects of rapid thermal annealing on InGaAs quantum dots grown by atomic layer molecular beam epitaxy to the structural transformation and optical properties are investigated. No misfit dislocation was observed from either the as-grown or annealed dots. The size and composition of the quantum dots become more uniform upon annealing mainly from the height fluctuation as predicted by the theoretical model. Large bandgap blue shifts, resulted from the In and Ga interdiffusion, were observed with the preservation of three-dimensional carrier confinement. The GaAs/AlGaAs superlattice was found to minimize the defect diffusion and dot interdiffusion during the high-temperature epitaxial overgrowth.

Original languageEnglish (US)
Pages (from-to)4344-4347
Number of pages4
JournalThin Solid Films
Volume515
Issue number10
DOIs
StatePublished - Mar 26 2007
Externally publishedYes

Keywords

  • Quantum-dot
  • Rapid thermal annealing
  • Transmission electron microscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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