Electron beam (e-beam) lithography has been used to fabricate arrays of rectangular and triangular shaped nickel dots. Dot dimensions range from 250 nm to 1 μm with separations of sub 100, 100 and 250 nm. The array dimensions are about 1 mm2. X-ray masks to perform the dot patterning by X-ray lithography have been fabricated too. The whole lithographic process is described together with preliminary results concerning the magnetic characterisation of the patterned structures.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering